Effect of MPCVD experimental conditions on field emission performance of carbon and nitrogen nanotube films
[1]Lu Zhanling,Zhao Ruixia,Yao Ning,et al.Effect of MPCVD experimental conditions on field emission performance of carbon and nitrogen nanotube films[J].Journal of Zhengzhou University (Engineering Science),2005,26(03):61-64.[doi:10.3969/j.issn.1671-6833.2005.03.016]
Copy
Journal of Zhengzhou University (Engineering Science)[ISSN
1671-6833/CN
41-1339/T] Volume:
26
Number of periods:
2005年03期
Page number:
61-64
Column:
Public date:
1900-01-01
- Title:
-
Effect of MPCVD experimental conditions on field emission performance of carbon and nitrogen nanotube films
- CLC:
- -
- Abstract:
-
The experimental conditions of microwave plasma chemical vapor deposition (MPCVD) were studied by orthogonal design test method. The results show that when the microwave power is 1 500W, the reaction gas pressure is 8.5kPa, and the flow ratio of methane, nitrogen and hydrogen is 8:20:80, the prepared carbon and nitrogen nanotube film field emission characteristics are the best, and the current density is 3.2 mA/cm8 when the electric field strength is 0.3 V/μm and the electric field strength is 5.2V/μm.
- References:
- -
- Similar References:
Memo
-
Last Update:
1900-01-01