[1]Liu Ping,Xu Han,Zang Jiajie,et al.The Design of Double Loop Control System for Electroplating Power Supply[J].Journal of Zhengzhou University (Engineering Science),2016,37(04):86-90.[doi:10.13705/j.issn.1671-6833.2016.04.019]
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Journal of Zhengzhou University (Engineering Science)[ISSN
1671-6833/CN
41-1339/T] Volume:
37
Number of periods:
2016 04
Page number:
86-90
Column:
Public date:
2016-08-31
- Title:
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The Design of Double Loop Control System for Electroplating Power Supply
- Author(s):
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College of information engineering, Zhengzhou University, 450001, China
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- Keywords:
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electroplating power supply; double loop control; loop stability
- CLC:
-
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- DOI:
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10.13705/j.issn.1671-6833.2016.04.019
- Abstract:
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The electroplating power supply has the characteristics of low voltage and high current operation, and the traditional voltage control mode is difficult to meet the control requirements due to defects such as slow dynamic response and inability to dynamically limit current. After comparative analysis, a dual loop controller control scheme using a voltage outer loop and a current inner loop is proposed. The electroplating power supply system is modeled and analyzed, Design a dual loop controller in the order of starting with the current inner loop and then the voltage outer loop. Use the Bode diagram to analyze the loop stability of the system model, design the loop parameters, and modify the current loop parameters based on the conditional stability phenomenon that occurs during the operation of the dual loop system. The experimental results show that the dual loop control system operates normally and has practical value