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Effect of MPCVD experimental conditions on field emission performance of carbon and nitrogen nanotube films
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[1]Lu Zhanling,Zhao Ruixia,Yao Ning,et al.Effect of MPCVD experimental conditions on field emission performance of carbon and nitrogen nanotube films[J].Journal of Zhengzhou University (Engineering Science),2005,26(03):61-64.[doi:10.3969/j.issn.1671-6833.2005.03.016]
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Journal of Zhengzhou University (Engineering Science)[ISSN 1671-6833/CN 41-1339/T] Volume: 26 Number of periods: 2005年03期 Page number: 61-64 Column: Public date: 1900-01-01
Title:
Effect of MPCVD experimental conditions on field emission performance of carbon and nitrogen nanotube films
Author(s):
Lu Zhanling; Zhao Ruixia; Yao Ning; etc

Keywords:

CLC:
-
DOI:
10.3969/j.issn.1671-6833.2005.03.016
Abstract:
The experimental conditions of microwave plasma chemical vapor deposition (MPCVD) were studied by orthogonal design test method. The results show that when the microwave power is 1 500W, the reaction gas pressure is 8.5kPa, and the flow ratio of methane, nitrogen and hydrogen is 8:20:80, the prepared carbon and nitrogen nanotube film field emission characteristics are the best, and the current density is 3.2 mA/cm8 when the electric field strength is 0.3 V/μm and the electric field strength is 5.2V/μm.

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Last Update: 1900-01-01
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