[1]罗文、孙本双、刘书含、陈杰、孟将、李树荣.ITO陶瓷靶材的磁控溅射过程中结瘤行为研究[J].郑州大学学报(工学版),2021,42(02):88-93.[doi:10.13705/j.issn.1671-6833.2021.02.003]
Luo Wen,Sun Benshuang,Liu Shuhan,et al.Study of tumoring behavior during sputtering of ITO ceramic targets[J].Journal of Zhengzhou University (Engineering Science),2021,42(02):88-93.[doi:10.13705/j.issn.1671-6833.2021.02.003]
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ITO陶瓷靶材的磁控溅射过程中结瘤行为研究(
)
《郑州大学学报(工学版)》[ISSN:1671-6833/CN:41-1339/T]
- 卷:
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42卷
- 期数:
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2021年02期
- 页码:
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88-93
- 栏目:
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- 出版日期:
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2021-04-12
文章信息/Info
- Title:
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Study of tumoring behavior during sputtering of ITO ceramic targets
- 作者:
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罗文、孙本双、刘书含、陈杰、孟将、李树荣
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西北稀有金属材料研究院稀有金属特种材料国家重点实验室;郑州大学河南省资源与材料工业技术研究院;
- Author(s):
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Luo Wen; Sun Benshuang; Liu Shuhan; Chen Jie; Meng General; Li Shurong;
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State Key Laboratory of Rare Metal Special Materials of Rare Metal Materials in Northwest China; Institute of Resources and Material Industry Technology, Henan University of Zhengzhou University;
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- 关键词:
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- Keywords:
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- DOI:
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10.13705/j.issn.1671-6833.2021.02.003
- 文献标志码:
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A
- 摘要:
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ITO陶瓷靶材溅射过程中的表面形貌、刻蚀环的深度、“结瘤”的显微结构及化学组分，并探讨“结瘤”形成机理。结果表明：随着溅射时间的延长，刻蚀环深度增大，靶材表面开始出现“结瘤”并向刻蚀环蔓延。“结瘤”主要由缺O富Sn的非化学计量比ITO组成，In2O3:Sn晶内的富Sn析出相粒子是溅射早期“结瘤”形成的主要原因，其散落的颗粒会成为新“结瘤”的诱发点，导致“结瘤”覆盖率迅速增大
- Abstract:
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In this study, the surface morphology, the depth of the etched ring and the microstructure and composition of the "nodules" of the ITO ceramic target during magnetron sputtering was studied. The results showed that the depth of the etch ring increased, the "nodule" was found on the surface of the target with increasing sputtering time. "Nodules" were mainly composed of non-stoichiometric ITO, which lack of O and rich in Sn. The Sn-rich precipitated particles in In2O3:Sn crystals were the main reason for the formation of "nodules" in the early stage of sputtering, and their scattered particles became the new induction points of "nodules", resulting in the rapid increase in the coverage of "nodules"
更新日期/Last Update:
2021-05-30