[1]鲁占灵,赵瑞霞,姚宁,等.MPCVD实验条件对碳氮纳米管薄膜场发射性能的影响[J].郑州大学学报(工学版),2005,26(03):61-64.[doi:10.3969/j.issn.1671-6833.2005.03.016]
Lu Zhanling,Zhao Ruixia,Yao Ning,et al.Effect of MPCVD experimental conditions on field emission performance of carbon and nitrogen nanotube films[J].Journal of Zhengzhou University (Engineering Science),2005,26(03):61-64.[doi:10.3969/j.issn.1671-6833.2005.03.016]
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MPCVD实验条件对碳氮纳米管薄膜场发射性能的影响(
)
《郑州大学学报(工学版)》[ISSN:1671-6833/CN:41-1339/T]
- 卷:
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26卷
- 期数:
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2005年03期
- 页码:
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61-64
- 栏目:
-
- 出版日期:
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1900-01-01
文章信息/Info
- Title:
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Effect of MPCVD experimental conditions on field emission performance of carbon and nitrogen nanotube films
- 作者:
-
鲁占灵; 赵瑞霞; 姚宁; 等.
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郑州大学材料物理教育部重点实验室,河南,郑州,450052;郑州大学材料工程学院,河南,郑州,450052, 河南建筑职工大学,河南,郑州,450052, 郑州大学材料物理教育部重点实验室,河南,郑州,450052
- Author(s):
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Lu Zhanling; Zhao Ruixia; Yao Ning; etc
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-
- 关键词:
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正交设计; 碳氮纳米管; 场发射
- Keywords:
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- DOI:
-
10.3969/j.issn.1671-6833.2005.03.016
- 文献标志码:
-
A
- 摘要:
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通过正交设计试验法研究了微波等离子体化学气相沉积(MPCVD)实验条件对碳氮纳米管薄某》⑸湫阅艿挠跋?结果表明,当微波功率为1 500W、反应气压为8.5kPa、甲烷、氮气和氢气的流量比为8:20:80时,制备的碳氮纳米管薄膜场发射特性最好,其开启电场强度为3.2 V/μm,电场强度为8.0V/μm时的电流密度为3.5 mA/cm2.
- Abstract:
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The experimental conditions of microwave plasma chemical vapor deposition (MPCVD) were studied by orthogonal design test method. The results show that when the microwave power is 1 500W, the reaction gas pressure is 8.5kPa, and the flow ratio of methane, nitrogen and hydrogen is 8:20:80, the prepared carbon and nitrogen nanotube film field emission characteristics are the best, and the current density is 3.2 mA/cm8 when the electric field strength is 0.3 V/μm and the electric field strength is 5.2V/μm.
更新日期/Last Update:
1900-01-01