[1]盛平东,张卫红,韩上海,等.化学镀Ni——P连续补给的工艺研究[J].郑州大学学报(工学版),1993,14(02):44-49.
 Sheng Ping East,Zhang Weihong,Korean Shanghai,et al.Chemical plating NI -P process research of continuous supply[J].Journal of Zhengzhou University (Engineering Science),1993,14(02):44-49.
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化学镀Ni——P连续补给的工艺研究()
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《郑州大学学报(工学版)》[ISSN:1671-6833/CN:41-1339/T]

卷:
14卷
期数:
1993年02期
页码:
44-49
栏目:
出版日期:
1993-06-28

文章信息/Info

Title:
Chemical plating NI -P process research of continuous supply
作者:
盛平东;张卫红;韩上海;
郑州工学院,郑州工学院,郑州工学院,
Author(s):
Sheng Ping East; Zhang Weihong; Korean Shanghai;
Zhengzhou Institute of Technology, Zhengzhou Institute of Technology, Zhengzhou Institute of Technology,
关键词:
本文给出了化学镀Ni—P含金槽液中镶盐及次亚磷酸钠消耗的规律性采用较简单的方法实现了在工作温度下直接对槽液进行连续补给采用这种方法可将液控制在最隹工作状态沉积速率恒定镀层质量良好。
Keywords:
Chemical plating NI -P
文献标志码:
A
摘要:
化学镀Ni—P
Abstract:
This article gives the regularity of chemical plating NI -P containing salt inlaid and sodium sodium phosphate in gold groove fluids. It adopts a simpler method to achieve continuous supply to the slot directly at the operating temperature. This method can be controlled to control the liquid in the most cricket.
更新日期/Last Update: 1900-01-01