[1]娄彦良,肖文凯..ZrO2薄膜的SPEB分析[J].郑州大学学报(工学版),2001,22(02):28-29.[doi:10.3969/j.issn.1671-6833.2001.02.009]
　Lou Yanliang,Xiao Wenkai.SPEB analysis of ZrO2 films[J].Journal of Zhengzhou University (Engineering Science),2001,22(02):28-29.[doi:10.3969/j.issn.1671-6833.2001.02.009]

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ZrO2薄膜的SPEB分析()

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《郑州大学学报(工学版)》[ISSN:1671-6833/CN:41-1339/T]

卷:

22

期数:

2001年02期

页码:

28-29

栏目:

出版日期:

1900-01-01

文章信息/Info

Title:

SPEB analysis of ZrO2 films

作者:

娄彦良; 肖文凯.

华中科技大学材料科学与工程学院,, 武汉大学机械工程系,

Author(s):

Lou Yanliang; Xiao Wenkai

关键词:

氧化锆薄膜;  慢正电子束;  成分

Keywords:

zirconia film;  slow positron beam;  Ingredients

DOI:

10.3969/j.issn.1671-6833.2001.02.009

文献标志码:

A

摘要:

用慢正电子束(SPEB)对自制ZrO2薄膜进行了成分分析.结果发现,ZrO2薄膜表层存在一个厚约20 nm的高正电子吸收层,该表层的特殊结构与Y在表层的偏聚有关.高于500 ℃的退火处理可以大大减小该层的厚度.

Abstract:

Compositional analysis of homemade ZrO2 films was performed by slow positron beam (SPEB). The results show that there is a high positron absorbing layer about 2 nm thick on the surface layer of ZrO20 film, and the special structure of the surface layer is related to the partial polymerization of Y on the surface layer. Annealing treatment above 500 °C can greatly reduce the thickness of this layer.

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